NDLI: Inverted pyramid texturisation without photolithography for multicrystalline solar cell

Content Provider	IEEE Xplore Digital Library
Author	Der-Chin Wu Dimitrov, D.Z. Ching-Hsi Lin Chen-Hsun Du Wei-Chih Hsu Wen-Haw Lu Chung-Wen Lan
Copyright Year	2010
Description	Author affiliation: Green Energy & Environment Research Laboratories, Industrial Technology Research Institute, Hsin-Chu, Taiwan, R.O.C. (Der-Chin Wu; Dimitrov, D.Z.; Ching-Hsi Lin; Chen-Hsun Du; Wei-Chih Hsu; Wen-Haw Lu; Chung-Wen Lan)
Abstract	New surface texturing method including formation of inverted pyramids has been further investigated in this study. Electroless deposition of Ag particles as metal catalyst in HF/H etching solution is found to be efficient for drilling nano-size holes into c-Si or m-Si. After etching back by KOH solution, the inverted pyramids structure gradually appears in c-Si (100) surface. Although the m-Si wafers have different orientation grains, the average reflection after texturing demonstrates lower than that of traditional acid treatment. The new texturing wafers were processed into cells with a conventional process including POCl diffusion (leading to 65 Ω/□), removal of native oxide by BOE solution. The deviations of sheet resistance on 5″ wafers are controlled below 5% which are consistent with that of acidic or alkaline treatment wafers. The SiNx antireflection coating was deposited uniformly by PECVD deposition. From the results of IV measurement, the conversion efficiency of new texturing has 0.1% higher than that of acidic treatment (texturied by Rena facilities). We expect the optimization of texturisation will lead to more short-circuit current density( J) and gain more conversion efficiencies.
Starting Page	003233
Ending Page	003236
File Size	1384461
Page Count	4
File Format	PDF
ISBN	9781424458905
ISSN	01608371
e-ISBN	9781424458929
DOI	10.1109/PVSC.2010.5616773
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2010-06-20
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Control and Systems Engineering Electrical and Electronic Engineering

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