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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Honda, T. Inagaki, M. Suzuki, H. Kojima, N. Ohshita, Y. Yamaguchi, M. |
| Copyright Year | 2010 |
| Description | Author affiliation: Toyota Technological Institute, Nagoya, Japan (Honda, T.; Inagaki, M.; Kojima, N.; Ohshita, Y.; Yamaguchi, M.) || Miyazaki University, Japan (Suzuki, H.) |
| Abstract | Minority-carrier lifetime (electron) in p-type GaAsN film is improved by chemical beam epitaxy (CBE) and thermal annealing. Growth rate (GR) in CBE is an important factor to improve minority-carrier lifetime in bulk (τ). For as-grown samples, τ is increased from 3.2 × $10^{2}$ ps (GR = 2 µm/h) to 9.0 × $10^{2}$ ps (GR = 0.4 ×m/h). The obtained τ is much longer than the minority-carrier lifetime (∼ $10^{1}$ ps) predicted by the reported carrier diffusion length and mobility. This improvement is due to the increase of nonradiative recombination lifetime (τ) caused by the decrease of nonradiative recombination centers. By thermal annealing, PL lifetime (τ) is increased. Therefore, CBE and thermal annealing have a high possibility to obtain the minority-carrier lifetime required to solar cells (> 1 ns). |
| Starting Page | 002053 |
| Ending Page | 002056 |
| File Size | 652780 |
| Page Count | 4 |
| File Format | |
| ISBN | 9781424458905 |
| ISSN | 01608371 |
| e-ISBN | 9781424458929 |
| DOI | 10.1109/PVSC.2010.5616424 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2010-06-20 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Content Type | Text |
| Resource Type | Article |
| Subject | Industrial and Manufacturing Engineering Control and Systems Engineering Electrical and Electronic Engineering |
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