NDLI: Chemical bath deposition (CBD) of iron sulfide thin films for photovoltaic applications, crystallographic and optical properties

Content Provider	IEEE Xplore Digital Library
Author	Prabukanthan, P. Soukup, R.J. Ianno, N.J. Sarkar, A. Kment, S. Kmentova, H. Kamler, C.A. Exstrom, C.L. Olejnicek, J. Darveau, S.A.
Copyright Year	2010
Description	Author affiliation: Department of Chemistry, University of Nebraska at Kearney, USA (Exstrom, C.L.; Darveau, S.A.) \|\| Department of Electrical Engineering, University of Nebraska-Lincoln, USA (Prabukanthan, P.; Soukup, R.J.; Ianno, N.J.; Sarkar, A.; Kment, S.; Kmentova, H.; Kamler, C.A.) \|\| Institute of Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic (Olejnicek, J.)
Abstract	A low temperature chemical deposition method has been developed to deposit iron/sulfur thin films onto soda lime glass substrates. The chemical bath deposition (CBD) consists of aqueous solution ferrous sulphate, disodium salt of ethylenediaminetetra-acetic acid (NaEDTA), sodium thiosulphate and organic solutions of ethylenediamine and methanol. The experiments were performed at room temperature and under two different conditions. The films were uniform and adhered well to the soda lime glass substrates. The deposited films were additionally processed in a sulfur and nitrogen atmosphere at a variety of different temperatures to form the pyrite phase of FeS. The as-deposited and annealed thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), optical absorption, auger electron spectroscopy (AES), and resistivity. The optimization of the FeS pyrite growth parameters was determined using XRD. Although both methods appeared to form FeS the second method is the preferable one where additional sulfurization at 450 °C for one hour yielded the films with the maximum crystalline order and stoichiometry.
Starting Page	002965
Ending Page	002969
File Size	1835801
Page Count	5
File Format	PDF
ISBN	9781424458905
ISSN	01608371
e-ISBN	9781424458929
DOI	10.1109/PVSC.2010.5614465
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2010-06-20
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	X-ray scattering Laboratories
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Control and Systems Engineering Electrical and Electronic Engineering

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