NDLI: PSG trapping of metal contaminants during belt furnace inline phosphorus diffusion in crystalline Si wafers

Content Provider	IEEE Xplore Digital Library
Author	Richter, P.J. Bottari, F.J. Wong, D.C.
Copyright Year	2010
Description	Author affiliation: BTU International, Inc. North Billerica, Massachusetts U.S.A. (Richter, P.J.; Bottari, F.J.; Wong, D.C.)
Abstract	Inline wet chemical phosphorus coating and thermal diffusion in a conveyor furnace is a high-throughput alternative to the conventional batch POCl process. There is now significant interest in the adoption of inline diffusion on an industrial scale in order to achieve a continuous flow, low-cost process which interfaces well with other inline processing steps. A concern about inline diffusion in conveyor furnaces has been the potential for conveyor belts to contribute to wafer contamination. The objective of this study is to use Secondary Ion Mass Spectrometry (SIMS) to (i) determine if commonly used nickel alloy conveyor belts are a potential source of wafer metal contamination during the diffusion firing and (ii) to investigate the effectiveness of phosphorus coating and the resulting post-diffusion phosphosilicate glass (PSG) to act as a contaminant isolating barrier, or trapping layer. We report SIMS depth and concentration profiles of Ni, Cr, and Fe, which indicate that the phosphosilicate glass produced during the diffusion process acts as an effective trap of metal contaminants.
Starting Page	003593
Ending Page	003596
File Size	839167
Page Count	4
File Format	PDF
ISBN	9781424458905
ISSN	01608371
e-ISBN	9781424458929
DOI	10.1109/PVSC.2010.5614375
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2010-06-20
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Iron Nickel Surface treatment Surface contamination Weaving conveyor furnace inline diffusion doping
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Control and Systems Engineering Electrical and Electronic Engineering

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