NDLI: Effects of different Si thicknesses on the performance of PECVD SiO double layers electrets

Content Provider	IEEE Xplore Digital Library
Author	Zhiyu Chen Xudong Zou Jinwen Zhang
Copyright Year	2008
Description	Author affiliation: Inst. of Microelectron., Peking Univ., Beijing, China (Zhiyu Chen; Xudong Zou; Jinwen Zhang)
Abstract	In this paper, charge decay of PECVD $SiO_{2}/Si_{3}N_{4}$ double layers electrets with different thicknesses of $Si_{3}N_{4}$ under different environmental conditions was investigated. Single layers of PECVD prepared $SiO_{2}$ and $Si_{3}N_{4}$ were also studied. Double layers electrets exhibits better charge stability than single layer under different conditions. As for the double layers with 2 nm-100 nm $Si_{3}N_{4},$ their charge stability at 250°C is as good as each other. However, if the $Si_{3}N_{4}$ thickness continues to increase, the charge stability will be decreased. Thicker layer of $Si_{3}N_{4}$ leads to better charge stability under 95%RH. Heat treatment at 250°C can improve charge stability under high humidity condition, especially for double layers electrets with thin $Si_{3}N_{4}.$ After heat treatment at 250°C for 3hrs, the PECVD $SiO_{2}/Si_{3}N_{4}$ double layers electrets with 50 nm $Si_{3}N_{4}$ show the optimized charge stability under different conditions.
Starting Page	2412
Ending Page	2415
File Size	1108758
Page Count	4
File Format	PDF
ISBN	9781424421855
DOI	10.1109/ICSICT.2008.4735057
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2008-10-20
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Electrets Stability Corona Electrodes Voltage Biomedical measurements Heat treatment Silicon compounds Laboratories Fabrication Si3N4 thickness SiO2/Si3N4 Double Layers PECVD
Content Type	Text
Resource Type	Article

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