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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Yi-Shao Lai Chin-Li Kao Ying-Ta Chiu Appelt, B.K. |
| Copyright Year | 2011 |
| Description | Author affiliation: 1255 E. Arques Ave., Sunnyvale, CA 94085, USA (Appelt, B.K.) || ASE Group 1 26 Chin 3rd Rd., Nantze Export Processing Zone, Kaohsiung 811, Taiwan (Yi-Shao Lai; Chin-Li Kao; Ying-Ta Chiu) |
| Abstract | Wafer-level chip-scale packages (WLCSPs) have become subject to the same drive for miniaturization as all electronic packages. The I/O count is increasing and ball pitch is shrinking at the expense of trace pitch and in turn, current densities are increasing. This leads to current crowding and Joule heating in the vicinity of solder joints and under bump metallurgy (UBM) structures where resistance values change significantly. These phenomena are responsible for structural damage of redistribution line (RDL)/UBM and UBM/solder interconnects due to ionic diffusion or electromigration. In this work, sputtered Al and electroplated Cu RDLs are examined and quantified by three-dimensional electrothermal coupling analysis. Results provide a guideline for estimating maximum allowable currents and electromigration lifetime. |
| Starting Page | 326 |
| Ending Page | 331 |
| File Size | 1412902 |
| Page Count | 6 |
| File Format | |
| ISBN | 9781612844978 |
| ISSN | 05695503 |
| e-ISBN | 9781612844985 |
| e-ISBN | 9781612844961 |
| DOI | 10.1109/ECTC.2011.5898533 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2011-05-31 |
| Publisher Place | Florida, USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Copper Electromigration Temperature measurement Soldering Vehicles Current density Mathematical model |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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