NDLI: The comparison of MWT solar cell fbrication by two novel and stable approaches

Content Provider	IEEE Xplore Digital Library
Author	Sung-Yu Chen Bing-Cyun Chen Chao-Ping Huang Der-Chin Wu Chen-Hsun Du Wen-Haw Lu Chern-Lin Chen Hsiang-Ming Hsueh Yu-Cheng Lin I-Hsuan Su
Copyright Year	2011
Description	Author affiliation: Green Energy & Environ. Res. Lab., Ind. Technol. Res. Inst., Chutung, Taiwan (Sung-Yu Chen; Bing-Cyun Chen; Chao-Ping Huang; Der-Chin Wu; Chen-Hsun Du; Wen-Haw Lu; Chern-Lin Chen) \|\| DuPont Electron. Technol., Taoyuan, Taiwan (Hsiang-Ming Hsueh; Yu-Cheng Lin; I-Hsuan Su)
Abstract	This study focuses on two novel approaches (co-firing and non-cofiring) for metal wrap through (MWT) solar cell fabrication and compares their electric properties using DuPont MWT specialized paste. The co-firing process involves 3 printing steps followed by co-firing of metallization contacts. The non-cofiring process involves sequential processing steps: first printing and firing of rear aluminum and front Ag finger; thereafter via and rear busbar printing and IR drying at 400°C. The best cell efficiency of 17.0% was demonstrated in this work based on 200 μm thick multi-crystalline silicon having an area of 125×125 $mm^{2}.$ On average, MWT cells showed 0.3~0.4% efficiency gain compared to conventional cells, due to 2% higher short circuit current (Isc). Although the shunting resistance of conventional solar cells is still slightly better than the two MWT approaches, results indicate that both MWT cells maintained good shunt performance and did not negatively impact fill factor (F.F.). The depth of vias is only 200 μm so that the contribution of via paste on Rs was concluded to be negligible compared to other dominating resistances. The electrical characteristics demonstrated in this work indicate that both MWT approaches proposed are reliable and industrially feasible.
Sponsorship	IEEE Electron Devices Soc.
Starting Page	001411
Ending Page	001413
File Size	783484
Page Count	3
File Format	PDF
ISBN	9781424499663
ISSN	01608371
e-ISBN	9781424499656
DOI	10.1109/PVSC.2011.6186220
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2011-06-19
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Photovoltaic cells Printing Resistance Silicon Metallization Fingers Firing
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Control and Systems Engineering Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

New printing pattern design and processing of MWT solar cells for pilot-line

Improved front side metallization for silicon solar cells by direct printing

Industrially feasible all side passivated silicon based C-MWT concentrator solar cells

Highly efficient crystalline silicon solar cells using a novel shallow angle metallization (SAM) technique

Non-contact printed aluminum metallization of Si photovoltaic devices

Mechanically V-textured low cost multicrystalline silicon solar cells with a novel printing metallization

Industrial large area n-type solar cells with aluminium rear emitter with stable efficiencies

Hot-melt screen-printing of front contacts on crystalline silicon solar cells

Rapid metallization paste firing of crystalline silicon solar cells

The comparison of MWT solar cell fbrication by two novel and stable approaches

Similar Documents

New printing pattern design and processing of MWT solar cells for pilot-line

Improved front side metallization for silicon solar cells by direct printing

Industrially feasible all side passivated silicon based C-MWT concentrator solar cells

Highly efficient crystalline silicon solar cells using a novel shallow angle metallization (SAM) technique

Non-contact printed aluminum metallization of Si photovoltaic devices

Mechanically V-textured low cost multicrystalline silicon solar cells with a novel printing metallization

Industrial large area n-type solar cells with aluminium rear emitter with stable efficiencies

Hot-melt screen-printing of front contacts on crystalline silicon solar cells

Rapid metallization paste firing of crystalline silicon solar cells

The comparison of MWT solar cell fbrication by two novel and stable approaches