NDLI: Broadband absorption enhancement using front pre-patterned substrate for thin film amorphous silicon solar cell

Content Provider	IEEE Xplore Digital Library
Author	Hao-Wei Han Min-An Tsai Ping-Chen Tseng Yu-Lin Tsai Liang-Hao Jin Hsin-Chu Chen Hsun-Wen Wang Chien-Chung Lin Peichen Yu Hao-Chung Kuo
Copyright Year	2011
Description	Author affiliation: Department of Electrophysics, National Chiao-Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan (Min-An Tsai; Hsun-Wen Wang) \|\| Institute of Photonic System, National Chiao Tung University, Tainan 711, Taiwan (Hao-Wei Han; Chien-Chung Lin) \|\| Department of Photonic & Institute of Electro-Optical Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan (Ping-Chen Tseng; Yu-Lin Tsai; Liang-Hao Jin; Hsin-Chu Chen; Peichen Yu; Hao-Chung Kuo)
Abstract	Light trapping in amorphous silicon thin film solar cells has been an intensive study owing to the low absorption coefficient in near-infrared. We demonstrate a frontal pre-patterned substrate (PPS) on amorphous silicon solar cells, utilizing scalable colloidal lithography, to serve both functions of anti-reflection and light trapping effect. We show that a solar cell with front pre-patterned substrate exhibits broadband enhanced external quantum efficiency due to both anti-reflection and light-trapping, with respect to an industrial standard cell using an Asahi U glass substrate which is mostly optimized for light trapping. The power conversion efficiency of the pre-patterned cell is measured 8.38%, which shows 56.34% and 8.83% enhancement compared to the reference cell with a flat substrate and the commercialized Asahi U-type substrate, respectively. Moreover, the angle-resolved absorption spectroscopy shows superior optical coupling to the absorber layer at large angles of incidence (AOIs), which guarantees sufficient light harvesting for the entire day. We also present a design optimization of frontal pre-patterned substrate with broadband antireflective subwavelength structures based on the theoretical calculation using a rigorous coupled wave analysis (RCWA) method. We can find the optimization size of PPS is 500nm bottom width and 450nm height from the simulation enhancement mapping figure.
Starting Page	000866
Ending Page	000869
File Size	427896
Page Count	4
File Format	PDF
ISBN	9781424499663
ISSN	01608371
e-ISBN	9781424499656
DOI	10.1109/PVSC.2011.6186089
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2011-06-19
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Photovoltaic cells Absorption Substrates Charge carrier processes Silicon Photonics Etching
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Control and Systems Engineering Electrical and Electronic Engineering

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