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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Fields, J.D. Dabney, M.S. Bollinger, V.P. van Hest, M.F.A.M. |
| Copyright Year | 2014 |
| Description | Author affiliation: Nat. Renewable Energy Lab., Golden, CO, USA (Fields, J.D.; Dabney, M.S.; Bollinger, V.P.; van Hest, M.F.A.M.) |
| Abstract | Monolithic interconnects in photovoltaic modules connect adjacent cells in series, and are typically formed sequentially, involving multiple deposition and scribing steps. Interconnect widths on the order of 500 μm every 10 mm result in about 5% dead area, which does not contribute to power generation in an interconnected solar panel. This work introduces an alternative interconnection method capable of producing interconnect widths of less than 100 μm, which can be accomplished in a single pass after deposition of active layers and electrodes. This alternative method can be used for all types of thin film photovoltaics. Voltage addition using printed interconnects and ongoing efforts to optimize performance of modules with printed interconnect are discussed. |
| Starting Page | 0162 |
| Ending Page | 0165 |
| File Size | 507327 |
| Page Count | 4 |
| File Format | |
| e-ISBN | 9781479943982 |
| DOI | 10.1109/PVSC.2014.6925474 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2014-06-08 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Ink Photovoltaic cells Nickel Lasers Electrodes Dielectrics atmospheric processin interconnects photovoltaics |
| Content Type | Text |
| Resource Type | Article |
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