NDLI: Toughening of thin films by high energy ion beams

Content Provider	IEEE Xplore Digital Library
Author	Jain, A. Loganathan, S. Jain, U.
Copyright Year	1996
Description	Author affiliation: Indian Inst. of Technol., New Delhi, India (Jain, A.)
Abstract	Refractory metal films tend to grow with a high degree of intrinsic tensile stress. As the film thickness increases, the integrated stress becomes high enough to cause loss of adhesion. In the present study, when chromium films on the order of 1 /spl mu/m were irradiated with Ni ions of energy 75 MeV, a reduction in strain as measured by X-ray diffraction was observed. Scratch Adhesion measurements demonstrated that this is accompanied by a large improvement in coating to substrate adherence. A new model is proposed to account for the observed effects and provides a basis on which to engineer stresses in thin films using ion beams. The model pictures mobile interstitials that escape from displacement cascades as nucleating in to loops in preferred orientations. The preferential orientation is a result of the lattice strain. As these aligned loops grow, they introduce a strain of their own which cancels out the initial strain. A mathematical formulation enables prediction of strain with irradiation dose for a given initial stress.
Starting Page	733
Ending Page	736
File Size	403113
Page Count	4
File Format	PDF
ISBN	078033289X
DOI	10.1109/IIT.1996.586536
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1996-06-16
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Transistors Ion beams Capacitive sensors Optical films Tensile stress Adhesives Strain measurement Chromium Energy measurement X-ray diffraction
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Determination of Strain in 10μm Spots using a Microdiffractometer

Growth of perpendicular FePt thin films at low temperature

A high precision B-H looper bending method of magnetostriction measurement

Amplitude Distribution Determination by an X-Ray Diffraction Technique

A passive, in situ micro strain gauge

Assessment of the strain of InP films on Si obtained by HVPE conformal growth

Lattice stress gradients in thin films deposited by reactive sputtering

On the scalability of source/drain current enhancement in thin film sSOI

Stress measurement of carbon cluster implanted layers with in-plane diffraction technique

Toughening of thin films by high energy ion beams

Similar Documents

Determination of Strain in 10μm Spots using a Microdiffractometer

Growth of perpendicular FePt thin films at low temperature

A high precision B-H looper bending method of magnetostriction measurement

Amplitude Distribution Determination by an X-Ray Diffraction Technique

A passive, in situ micro strain gauge

Assessment of the strain of InP films on Si obtained by HVPE conformal growth

Lattice stress gradients in thin films deposited by reactive sputtering

On the scalability of source/drain current enhancement in thin film sSOI

Stress measurement of carbon cluster implanted layers with in-plane diffraction technique

Toughening of thin films by high energy ion beams