NDLI: Multicharged boron ions from pure elements evaporated in a 2.45-GHz ECR source

Content Provider	IEEE Xplore Digital Library
Author	Kato, Y. Fukukawa, A. Ishii, S.
Copyright Year	1996
Description	Author affiliation: Dept. of Electron. & Inf., Toyama Univ., Japan (Kato, Y.)
Abstract	Multicharged boron ions have been produced by vaporizing pure boron powder in a 2.45-GHz electron cyclotron resonance (ECR) ion source. A vapor source is boron-nitride crucible with a tantalum heater and radiation shields, and set in an ECR plasma along the geometrical axis of the mirror field. The opening of the crucible faces an ellipsoidal ECR zone formed at the bottom of the magnetic mirror trap. The vapor pressure of boron covers the range of the experimental pressure (10/sup -4//spl sim/10/sup -3/ Pa) with the crucible temperature of about 1500/spl deg/C. Insertion of the vapor source scarcely affects charge state distributions in the ECR plasma, while inserting a dc-biased target into the ECR plasma seriously deteriorated them. Production efficiency of multicharged boron ions have been improved much more than that in the experiments by sputtering boride target. The boron flux into the ECR zone Is evaluated in both cases of evaporation and sputtering. It is considered that this enhanced production results from the energy reduction of the neutral boron particles.
Starting Page	338
Ending Page	341
File Size	367889
Page Count	4
File Format	PDF
ISBN	078033289X
DOI	10.1109/IIT.1996.586278
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1996-06-16
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Boron Plasma sources Plasma temperature Magnetic resonance Mirrors Sputtering Powders Electrons Cyclotrons Ion sources
Content Type	Text
Resource Type	Article

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