NDLI: Replacing silicon monitors with in situ particle monitoring in the GSD200 ion implanter

Content Provider	IEEE Xplore Digital Library
Author	Malenfant, J. Sedgewick, J.E. Burghard, R.
Copyright Year	1996
Description	Author affiliation: Microelectron. Div., IBM Corp., Essex Junction, VT, USA (Malenfant, J.)
Abstract	Silicon monitor wafers are typically used to evaluate the cleanliness of an ion implanter in a production environment. Surface detection methods count particles on these wafers prior to processing. The same surface detection methods are used after implantation on the monitor, with the difference between the two measurements determining the cleanliness of the implant tool. This process may occur several times a day. Special monitor wafers and machine time are required to perform this technique, which provides only a snapshot of the machine's particulate performance. It may also, on occasion, yield incorrect results that can lead to unnecessary intervention. In-situ particle monitoring, on the other hand, allows real time particle detection without machine downtime, costly monitor wafers and the incorrect data usually associated with surface detection techniques. The High Yield Technology Model 20SX in-situ particle monitor was integrated into the Eaten GSD200 ion implanter and used at the IBM Microelectronics Division semiconductor manufacturing facility in Essex Junction, Vermont, to replace monitor wafers. The paper will discuss the integration of the 20SX sensor into the GSD200 and the characterization work that led to the elimination of silicon monitors.
Starting Page	162
Ending Page	165
File Size	325982
Page Count	4
File Format	PDF
ISBN	078033289X
DOI	10.1109/IIT.1996.586168
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1996-06-16
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Silicon Implants Microelectronics Condition monitoring Semiconductor device modeling Radiation detectors Control systems Atmospheric modeling Production facilities Sensor phenomena and characterization
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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