NDLI: On board statistical process control on the NV-GSD series ion implanter

Content Provider	IEEE Xplore Digital Library
Author	Sedgewick, J.E. Franceschelli, A.J. Hazelton, J. Malenfant, J.
Copyright Year	1996
Description	Author affiliation: Semicond. Equipment Div., Eaton Corp., Beverly, MA, USA (Sedgewick, J.E.)
Abstract	Statistical Process Control has had increasing popularity in the manufacturing environment in recent years. SPC is the process of collecting information that is indicative of the health of the equipment and or process. Analysis of the data can determine the normal operating parameters of a machine or process and deviations from the norm. Long term operating trends can also be detected. This data collection and analysis technique has proven extremely useful on a high current ion implanter in a semiconductor fabrication facility. The on-board Statistical Process Control option is available on the NV-GSD200 series implanter as well as the NV-GSD/HE implanter. The SPC package provides a user friendly method to look for process trends or machine parameter changes that would otherwise be difficult to monitor. This paper will discuss the fundamentals of the SPC package and its application in a semiconductor fabrication facility.
Starting Page	501
Ending Page	504
File Size	540523
Page Count	4
File Format	PDF
ISBN	078033289X
DOI	10.1109/IIT.1996.586413
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1996-06-16
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Process control Condition monitoring Implants Data analysis Fabrication Packaging machines Computerized monitoring Helium Semiconductor device packaging Databases
Content Type	Text
Resource Type	Article

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