NDLI: Exploration and prevention of photo resist burning in a high current ion implanter

Content Provider	IEEE Xplore Digital Library
Author	Romig, T. Bishop, M. Rio, V.
Copyright Year	1996
Description	Author affiliation: SEMATECH, Austin, TX, USA (Romig, T.)
Abstract	The current generation of ion implanters an capable of beam currents as high as 20 mA of Arsenic. Although this represents a big improvement in the implanter's through-put, often it can't be utilized because the photo resist begins to bubble and burn at /spl sim/15 mA of beam current. Screening experiments were used to explore I-line and G-line type photo resists with different solvents. Various beam currents and beam energies were used to look at the different affects of resist burning. In all cases, the in-situ particle sensor was able to detect the resist burning events as soon as they began. A residual gas analyzer (RGA) also detected the resist burning events, in real-time, and captured the occurrence of a xylene peak in the worst cases. The case in which no resist burning was observed used a high temperature deep UV treatment and an optical edge bead removal process. This paper will discuss the characteristics of photo resist burning and the applications of deep UV treatment and edge bead removal to prevent it.
Starting Page	190
Ending Page	193
File Size	397481
Page Count	4
File Format	PDF
ISBN	078033289X
DOI	10.1109/IIT.1996.586181
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1996-06-16
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Resists Cooling Solvents Event detection Temperature control Throughput Implants Temperature measurement Optical sensors Writing
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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