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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Vudathu, S.P. Laur, R. |
| Copyright Year | 2007 |
| Description | Author affiliation: Univ. of Bremen, Bremen (Vudathu, S.P.; Laur, R.) |
| Abstract | The intricacy in the manufacturing of MEMS devices has resulted in decreasing parametric yields. The problem of reduced parametric yield is increasing with the waning feature sizes. The necessity for yield enhancement in MEMS designs and particularly in commercial MEMS is being increasingly felt by the industry and therefore by the designers. There has been no standard methodology that could be followed to enhance yield in the design phase. In this paper we undertake effort in order to standardize a best practice design method in order to achieve a better yield in the design phase. The method is still in its infancy and has good scope for development. The validity of the proposed method is demonstrated via a simulation based approach on a U-Shaped micro electro thermal actuator. |
| Starting Page | 1947 |
| Ending Page | 1952 |
| File Size | 2624145 |
| Page Count | 6 |
| File Format | |
| ISBN | 1424409845 |
| ISSN | 05695503 |
| DOI | 10.1109/ECTC.2007.374067 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2007-05-29 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Design methodology Micromechanical devices Best practices Microelectronics Microelectromechanical devices Fabrication Robustness Manufacturing industries Process design Standardization Yield Enhancement in MEMS MEMS Process Induced Variations Design Methodologies Yield Sensitive Parameters |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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