NDLI: Effect of prepared conditions on soft magnetic properties and microstructure of CoFeHfO thin film

Content Provider	IEEE Xplore Digital Library
Author	Tho, L.V. Lee, K.E. Kim, C.G. Kim, C.O.
Copyright Year	2007
Description	Author affiliation: Dept. of Mater. Sci. & Eng., Chungnam Nat. Univ., Seoul (Tho, L.V.; Lee, K.E.; Kim, C.G.; Kim, C.O.)
Abstract	CoFeHfO thin films have been prepared by RF sputtering method. Prepared conditions are the most important to take shape microstructure of thin films. In order to find out the optimal conditions to fabricate CoFeHfO thin films which exhibit the best magnetic properties to application for high frequency, relation between prepared conditions and soft magnetic properties have been investigated. The results shows that excellent soft magnetic properties were associated strongly with orientation and grain size of alpha-CoFe and alpha-Co(Fe) phases. Orientation of nanocrystalline depends strongly on the time sputtering (film thickness) because of interaction energy. Grain size and resistivity depend on oxygen and deposition rate because of reaction when sputtering. Consequently, the film with thickness of 300 nm and partial of oxygen of 6% is nearly single phased and exhibits excellence magnetic properties with the value of coercivity $H_{c}$ of 0.18 Oe and anisotropy magnetic $H_{k}$ of 49.92 Oe, along the hard axis.
Starting Page	1202
Ending Page	1205
File Size	3595836
Page Count	4
File Format	PDF
ISBN	1424406102
DOI	10.1109/NEMS.2007.352235
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2007-01-16
Publisher Place	Thailand
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Magnetic properties Microstructure Magnetic films Sputtering Grain size Radio frequency Shape Conductivity Coercive force Anisotropic magnetoresistance high frequency Prepared conditions microstructure magnetic properties
Content Type	Text
Resource Type	Article

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