NDLI: Nanopatterning with Extreme Ultraviolet Interference Lithography for Nanoelectronics and Biotechnology

Content Provider	IEEE Xplore Digital Library
Author	Stadler, B. Solak, H. Frerker, S. Grandin, M. Voros, J.
Copyright Year	2007
Description	Author affiliation: Lab. of Biosensors & Bioelectronics, Inst. for Biomed. Eng., Zurich (Stadler, B.)
Abstract	We present a platform for the controlled patterning of nano-objects such as gold colloids in the micron and nanorange. We are separating the lithography step from the subsequent functionalization. This has many advantages among them the independence of the linkage chemistry and the lithography process and the possibility to position individual nano-objects. The lithography step is extreme UV interference lithography in the nanorange and standard photolithography in the micron range. As a proof of concept, micro and nanopatterns of single-stranded DNAs are created in an inert background of PLL-g-PEG. The DNA patterns are converted to arrays of DNA-tagged gold colloids by directed self-assembly using the specificity of DNA hybridization. Especially nanoline arrays of gold colloids have the potential to serve as e.g. nanowires for electrical label-free biosensing. In addition, we also present the characterization of the adsorption kinetics of 20 nm DNA-tagged gold colloids via SPR.
Starting Page	406
Ending Page	410
File Size	592648
Page Count	5
File Format	PDF
ISBN	1424406102
DOI	10.1109/NEMS.2007.352046
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2007-01-16
Publisher Place	Thailand
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Nanopatterning Ultraviolet sources Interference Lithography Nanoelectronics Biotechnology Gold DNA Couplings Chemistry
Content Type	Text
Resource Type	Article

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