NDLI: Fabrication of Three Dimensional X-ray Mask using MEMS Technology

Content Provider	IEEE Xplore Digital Library
Author	Mekaru, H. Takano, T. Awazu, K. Takahashi, M. Maeda, R.
Copyright Year	2007
Description	Author affiliation: Adv. Manuf. Res. Inst., National Inst. of Adv. Ind. Sci. & Technol., Tsukuba (Mekaru, H.; Takano, T.; Awazu, K.; Takahashi, M.; Maeda, R.)
Abstract	The authors fabricated silicon microstructures with inclined sidewalls on the SOI wafer by using tapered-RIE technique. Then, this wafer was processed to an X-ray mask that made the silicon structure an X-ray absorber. The inclined angle of the sidewall of silicon X-ray absorbers has been changed from 60 to 71 degrees by adjusting the pressure of the mixed gas in the process chamber of the ICP-RIE system. The thickness distribution of the X-ray absorber is different according to the difference of the inclined angle of the X-ray absorber. As a result, the transmission intensity of X-rays is locally changed, and the energy distribution of X-rays irradiated on a resist can be controlled. The authors experimented on the X-ray lithography using this X-ray gray mask and the beamline BL-4 in the synchrotron radiation facility TERAS of AIST. As a result, we succeeded in fabrication of three-dimensional PMMA microstructures by only one X-ray exposure without scanning and rotating the X-ray exposure stage.
Starting Page	447
Ending Page	451
File Size	5290261
Page Count	5
File Format	PDF
ISBN	1424406102
DOI	10.1109/NEMS.2007.352056
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2007-01-16
Publisher Place	Thailand
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Fabrication Micromechanical devices Microstructure Resists X-ray lithography Silicon Etching Textile industry Passivation Shape control Silicon on insulator technology Masks Plasma materials-processing applications
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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