NDLI: Metal ion discharge in crossed fields and its applications

Content Provider	IEEE Xplore Digital Library
Author	Churkin, I.N. Volosov, V.I. Steshov, A.G.
Copyright Year	1998
Description	Author affiliation: Budker Inst. of Nucl. Phys., Novosibirsk, Russia (Churkin, I.N.)
Abstract	Summary form only given, as follows. A metal ion discharge in crossed E/spl times/B fields is considered in the report. The discharge is different from discharges which exist in the analogous configuration systems. The main working matter of the discharge is created from a cathode material by means of sputtering of its surface and ionization of sputtered atoms inside the plasma. Metal ions drift in crossed fields in the interelectrode space. The first modification in a trap with crossed fields is the source of multicomponent atomic fluxes. Two fluxes of metal atoms with different energies leave the source in the radial direction. Slow atoms are atoms sputtered from a cathode surface and non-ionized by plasma. Accelerated atoms are created by means of accelerating the metal plasma ions by a radial electrical field and its resulting charge-exchange inside the plasma volume. The atomic fluxes can be used for surface modification. Experiments on atomic implantation and accelerated atom beam assisted deposition are presented. Besides it is possible to use the metal ion discharge for generation of plasma flow with metal ions. Metal ions are magnetized in the near cathode area where the electrical field is small. This dense plasma cloud flows out the source along the axial magnetic field. Experimental results on the formation of titanium ion plasma flow is considered. The source of plasma flow with metal ions can be applied to plasma isotope separation systems and space engines.
File Size	128140
File Format	PDF
ISBN	0780347927
ISSN	07309244
DOI	10.1109/PLASMA.1998.677804
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1998-06-01
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Atomic measurements Plasma sources Plasma accelerators Plasma density Atomic layer deposition Cathodes Acceleration Fault location Surface discharges Atomic beams
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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