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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Srivastava, A.K. Pingree, R. Ferris, D. |
| Copyright Year | 1998 |
| Description | Author affiliation: Eaton Corp., Rockville, MD, USA (Srivastava, A.K.) |
| Abstract | Summary form only given. A new microwave driven (2.45 GHz) plasma source has been developed at Fusion Systems Division of the Eaten Corporation's Semiconductor Equipment Operation, to be used as a downstream asher. It operates by exciting the TM/sub 012/ resonant microwave mode in a cylindrical cavity structure. The source consists of an internally tuned microwave cavity that dynamically adjusts the cavity dimensions to match all changes in the plasma impedance. This is accomplished by a sliding short, and adjustable antenna lengths. Internal tuning ensures maximum power input to the plasma for all operating conditions by minimizing reflected power to less than 1% over a large operating window. Due to its novel internal tuning mechanism, there is no need for any external matching network, and therefore negligible power is lost to this internal matching unit. The plasma is totally contained in a dielectric tube running through the length of the cylindrical microwave cavity and is transported downstream for ashing. |
| File Size | 119254 |
| File Format | |
| ISBN | 0780347927 |
| ISSN | 07309244 |
| DOI | 10.1109/PLASMA.1998.677650 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1998-06-01 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Plasma sources Resists Ash Plasma applications Atomic measurements Radio frequency Resonance Microwave devices Tuning Plasma transport processes |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering |
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