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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Arman, M.J. |
| Copyright Year | 1998 |
| Description | Author affiliation: Div. of High Power Microwave, Air Force Res. Lab., Kirtland AFB, NM, USA (Arman, M.J.) |
| Abstract | Summary form only given. The advantages of the radial acceletron over conventional sources has been reported by Arman (1996). Briefly, the radial structure of this design allows for much smaller impedances and thus higher powers, the growth rate is large because of the transit-time nature of the interaction, and the source is compact because there is no need for external magnetic fields. Adding plasma to the interaction region of certain high power microwave sources has had beneficial effect on the growth rate and efficiency. We believe the radial acceletron will also be enhanced by the presence of positively charged plasma in the main cavity. Here I report on the results of adding plasma to the radial acceletron. The research is carried out numerically by simulation, using the PIC codes MAGIC and SOS. The plasma enhanced radial acceletron can possibly generate gigawatts of coherent RF power in a wide range of frequencies. |
| File Size | 117095 |
| File Format | |
| ISBN | 0780347927 |
| ISSN | 07309244 |
| DOI | 10.1109/PLASMA.1998.677660 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1998-06-01 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Plasma sources Klystrons Laboratories Plasma simulation Microwave oscillators Frequency Computational modeling Electromagnetic coupling Impedance High power microwave generation |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering |
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