NDLI: Study of power enhancement and frequency shifting of microwave emission in a plasma filled non-uniform BWO

Content Provider	IEEE Xplore Digital Library
Author	Young, D. Ishihara, O. Grabowski, C. Schamiloglu, E. Gahl, J.
Copyright Year	1998
Description	Author affiliation: Dept. of Electr. Eng., Texas Tech. Univ., Lubbock, TX, USA (Young, D.)
Abstract	Summary form only given. Recent experiments reported an improved efficiency in high power microwave generation by applying a non-uniform slow wave structure (SWS) or using a plasma filling in a backward wave oscillator (BWO). A combined scheme of plasma filling in a non-uniform SWS is investigated to further increase microwave output power. An annular cathode of radius 1 cm produces a 500 keV electron beam of density 10/sup 12/ cm/sup -3/. A plasma of density 10/sub 12/ cm/sup -3/ with temperatures T/sub c//spl ap/T/sub i//spl ap/10 eV is launched into the SWS from a cylindrical plasma gun placed inside the annular cathode. In a 2 1/2 D simulation, the annular electron beam is injected, with the use of a guiding magnetic field, into a cutoff neck with a radius of 11 mm. This electron beam moves into an 18 cm long non-uniform SWS section with an average radius of 1.5 cm, and then is guided into the waveguide wall. The voltage pulse in the simulation rises to 500 kV in 1 ns and remains flat for the remainder of the 20 ns. These simulations have shown that the microwave output power of a few hundred megawatts is nearly doubled when compared with the case without plasma, while the microwave frequency is upshifted on the order of 100 MHz. Most of the plasma electrons are quickly (<13 ns) driven out of the core plasma, leaving only the beam electrons flowing in an ionic background. Such a now might lead to an instability that could help to further bunch the electron beam and increase microwave power production.
File Size	110100
File Format	PDF
ISBN	0780347927
ISSN	07309244
DOI	10.1109/PLASMA.1998.677669
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1998-06-01
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Frequency Electron beams Plasma simulation Plasma density Plasma waves Plasma temperature Filling Power generation Cathodes High power microwave generation
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in