NDLI: Up-scaling and optimization of thin-film solar cells and modules based on amorphous and microcrystalline silicon

Content Provider	IEEE Xplore Digital Library
Author	Repmann, T. Kilper, T. Appenzeller, W. Zahren, C. Stiebig, H. Rech, B.
Copyright Year	2005
Description	Author affiliation: Inst. of Photovoltaics, Forschungszentrum Julich GmbH, Germany (Repmann, T.; Kilper, T.; Appenzeller, W.; Zahren, C.; Stiebig, H.; Rech, B.)
Abstract	This paper reviews the status of the process development and up-scaling of thin-film solar cells and modules based on amorphous (a-Si:H) and microcrystalline (/spl mu/c-Si:H) silicon at the Institute of Photovoltaics (IPV) on substrate areas up to 30/spl times/30 cm/sup 2/. Initial efficiencies of 10.6% and 10.7% were achieved for a-Si:H//spl mu/c-Si:H modules on 30/spl times/30 cm/sup 2/ and 10/spl times/10 cm/sup 2/ substrates, respectively. The latter ones yielded a stabilized efficiency of 10.1% which was independently confirmed by NREL. We address the process development for /spl mu/c-Si:H solar cells in a high pressure regime using plasma excitation frequencies of 13.56 and 40.68 MHz. High deposition rates up to 15 /spl Aring//s could be achieved by applying high discharge powers at 40.68 MHz. We discuss technological aspects related to the up-scaling of the PECVD processes to areas of 1 m/sup 2/ and above which is the topic of a recently started German R&D project of Applied Films GmbH & Co. KG (AF), Forschungsund Applikationslabor Plasmatechnik GmbH (FAP) and the IPV.
Sponsorship	IEEE Electron Devices Soc. (USA)
Starting Page	1383
Ending Page	1388
File Size	1193756
Page Count	6
File Format	PDF
ISBN	0780387074
ISSN	01608371
DOI	10.1109/PVSC.2005.1488398
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-01-03
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Semiconductor thin films Photovoltaic cells Amorphous materials Silicon Substrates Frequency Glass Electrodes Plasma measurements Plasma temperature
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Control and Systems Engineering Electrical and Electronic Engineering

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