NDLI: Yield and efficiency optimization through improved control of surface oxide during string ribbon growth

Content Provider	IEEE Xplore Digital Library
Author	Clark-Phelps, R.B. Wallace, R.L. Gabor, A.M. Harvey, D.S. Cretella, M.C. Hanoka, J.I.
Copyright Year	2005
Description	Author affiliation: Evergreen Solar Inc., Marlboro, MA, USA (Clark-Phelps, R.B.; Wallace, R.L.; Gabor, A.M.; Harvey, D.S.; Cretella, M.C.; Hanoka, J.I.)
Abstract	To minimize production costs and maximize yields, Evergreen Solar has developed a "no-etch" process sequence in which wafers move directly from string ribbon growth to diffusion with no intermediate processing. In this process sequence, the surface oxide thickness d/sub ox/ can affect the diffusion process if it becomes too large. To characterize the process window, we have measured the dependence of sheet resistance and phosphorus dose on d/sub ox/ for Evergreen's standard diffusion process. We find that the sheet resistance has good within-wafer uniformity and is relatively insensitive to oxide thickness for d/sub ox/ < 80 /spl Aring/, yielding a broad process window. Lastly, we report that significant advances in Evergreen's crystal growth furnace design have enabled much tighter control over surface oxide thickness than was previously possible. We demonstrate excellent control of oxide thickness in the range 10-70 /spl Aring/ in a pilot line of dual-ribbon production furnaces over a period of two months.
Sponsorship	IEEE Electron Devices Soc. (USA)
Starting Page	1078
Ending Page	1080
File Size	452550
Page Count	3
File Format	PDF
ISBN	0780387074
ISSN	01608371
DOI	10.1109/PVSC.2005.1488321
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-01-03
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Strontium Furnaces Production Electrical resistance measurement Measurement standards Thickness control Thickness measurement Costs Surface resistance Diffusion processes
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Control and Systems Engineering Electrical and Electronic Engineering

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