NDLI: Optimization and magnetic field behavior of sputtered submicron YBa/sub 2/Cu/sub 3/O/sub 7/ step-edge Josephson-junctions

Content Provider	IEEE Xplore Digital Library
Author	Vaupel, M. Ockenfuss, G. Wordenweber, R.
Copyright Year	2002
Abstract	YBa/sub 2/Cu/sub 3/O/sub 7/ step-edge junctions with widths down to 0.5 /spl mu/m are fabricated on SrTiO/sub 3/-substrates by Ar ion-beam milling of the steps, high-pressure on-axis magnetron sputtering and, finally, electron beam patterning and ion-beam etching of the microbridge. For ratios of film thickness to step height of about 1/2 the current-voltage characteristics show Shapiro steps under microwave irradiation and RSJ (resistively shunted junction)-like behavior. The periodic dependence of the critical current upon the magnetic field resembles a Fraunhofer-pattern. The period of the current variation /spl Delta/B/sub 0/ depends upon the width w of the junction according to the theoretical prediction for planar thin Josephson junctions: /spl Delta/B/sub 0/=1.84/spl phi//sub 0//w/sup 2/. Junctions with widths of 0.7 /spl mu/m possess a large magnetic field stability with /spl Delta/B/sub 0//spl ap/100 G. Small junctions (w<1 /spl mu/m) exhibit voltage jumps in the Fraunhofer pattern, which are explained by flux penetration of single vortices into the superconducting electrodes.
Sponsorship	Council on Superconductivity Appl. Superconductivity Conference Inc MIT
Starting Page	3454
Ending Page	3457
Page Count	4
File Size	579315
File Format	PDF
ISSN	10518223
Volume Number	7
Issue Number	2
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1997-06-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Magnetic fields Josephson junctions Argon Milling Magnetic flux Superconducting magnets Sputtering Electron beams Sputter etching Magnetic films
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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