NDLI: In-line adhesion monitoring and the effects of process variations on adhesion in MEMS

Content Provider	IEEE Xplore Digital Library
Author	Shavezipur, M. Gou, W. Carraro, C. Tian, Y. Maboudian, R. Gelmi, I. Campedelli, R. Azpeitia, M.
Copyright Year	2013
Description	Author affiliation: Dept. of Chem. & Biomol. Eng., Univ. of California, Berkeley, Berkeley, CA, USA (Shavezipur, M.; Gou, W.; Carraro, C.; Tian, Y.; Maboudian, R.) \|\| STMicroelectron., Milan, Italy (Gelmi, I.; Campedelli, R.; Azpeitia, M.)
Abstract	Capacitive microinstruments with compliant electrodes for accurate determination of small adhesion force between polycrystalline silicon surfaces are presented. The test structures can determine the adhesion force as low as 60nN. Using these devices, the effects of fabrication and release variations on the adhesion force are investigated. The measurement results show that the adhesion force does not depend on the apparent contact area over the range of parameters examined. Moreover, a distinct difference between adhesion force values measured on wafers with different fabrication processes is observed that is attributed to different surface topography. The distribution of adhesion force in 8" wafers is also studied and is found not uniform throughout a single wafer.
Starting Page	1464
Ending Page	1467
File Size	639537
Page Count	4
File Format	PDF
ISBN	9781467359832
ISSN	21641641
DOI	10.1109/Transducers.2013.6627056
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2013-06-16
Publisher Place	Spain
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Adhesives Force Force measurement Pollution measurement Surface topography Electrodes Micromechanical devices process variation MEMS reliability microinstrument adhesion force electrostatic actuation capacitive measurement
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
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