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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Okojie, R.S. Nguyen, V. Savrun, E. Lukco, D. |
| Copyright Year | 2011 |
| Description | Author affiliation: ASRC Research Corp., NASA Glenn Research Center, Cleveland, OH, USA (Lukco, D.) || NASA Glenn Research Center, Cleveland, OH, USA (Okojie, R.S.) || Sienna Technologies, Inc. Woodingville, WA, USA (Nguyen, V.; Savrun, E.) |
| Abstract | We report advancement in the reliability of silicon carbide pressure sensors operating at 600 °C for extended periods. The large temporal drifts in zero pressure offset voltage at 600 °C observed previously were significantly suppressed to allow improved reliable operation. This improvement was the result of further enhancement of the electrical and mechanical integrity of the bondpad/contact metallization, and the introduction of studded bump bonding on the pad. The stud bump contact promoted strong adhesion between the Au bond pad and the Au die-attach. The changes in the zero offset voltage and bridge resistance over time at temperature were explained by the microstructure and phase changes within the contact metallization, that were analyzed with Auger electron spectroscopy (AES) and field emission scanning electron microscopy (FE-SEM). |
| Starting Page | 2875 |
| Ending Page | 2878 |
| File Size | 4315431 |
| Page Count | 4 |
| File Format | |
| ISBN | 9781457701573 |
| e-ISBN | 9781457701566 |
| DOI | 10.1109/TRANSDUCERS.2011.5969561 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2011-06-05 |
| Publisher Place | China |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Temperature sensors Gold Silicon carbide Resistance Temperature measurement Metallization Reliability Silicon Carbide High Temperature Pressure Sensor Offset Voltage Drift |
| Content Type | Text |
| Resource Type | Article |
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