NDLI: GREMA: Graph reduction based efficient mask assignment for double patterning technology

Content Provider	IEEE Xplore Digital Library
Author	Yue Xu Chu, C.
Copyright Year	2009
Description	Author affiliation: Electrical and Computer Engineering, Iowa State University, Ames, IA 50011 (Yue Xu; Chu, C.)
Abstract	Double patterning technology (DPT) has emerged as the most hopeful candidate for the next technology node of the ITRS roadmap [1]. The goal of a DPT decomposer is to decompose the entire layout on each layer onto two masks. It assigns two features to different masks if their spacing is less than a predefined threshold. Besides, some features must be sliced and put onto two masks so that there would be a feasible solution for mask assignment. Such slicing will cause stitches that affect yield. So decomposer needs to minimize their number. In this paper, we formulate the DPT decomposition problem as a maximum cut problem. We propose an extremely efficient two-stage decomposition algorithm called GREMA. The first stage of GREMA generates a set of candidate stitches to ensure that feasible solutions exist for DPT decomposition. The second stage uses maximum cut to find the minimal set of stitches. Our decomposer is able to solve much larger realistic design problems. Experiments demonstrated that GREMA achieved great performance on resolving conflicts with greatly reduced runtime.
Starting Page	601
Ending Page	606
File Size	570733
Page Count	6
File Format	PDF
ISBN	9781605588001
ISSN	10923152
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2009-11-02
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Association for Computing Machinery, Inc. (ACM)
Subject Keyword	Runtime Lithography Permission Very large scale integration Resists Delay Etching Silicon Circuits Euclidean distance
Content Type	Text
Resource Type	Article
Subject	Computer Graphics and Computer-Aided Design Computer Science Applications Software

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