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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Morita, T. Kabasawa, M. Sugitani, M. |
| Copyright Year | 2000 |
| Description | Author affiliation: Sumitomo Eaton Nova Corp., Ehime, Japan (Morita, T.) |
| Abstract | Beam cleaning by Ar/sup +/, Xe/sup +/, F/sup +/ and SiF/sub 3//sup +/ implants was studied for arsenic cross-contamination reduction. After As/sup +/ implantation at 40 keV with a dose of 1/spl times/10/sup 17/ ions/cm/sup 2/, cross-contamination was measured by TXRF using Ar/sup +/ implants at 40 keV with a dose of 5/spl times/10/sup 15/ ions/cm/sup 2/, to check each cleaning procedure. The concentration of the initial As cross-contamination after As/sup +/ implantation increased to about 1/spl times/10/sup 13/ atoms/cm/sup 2/. The contamination level went down to about 1/10th when using Ar/sup +/ cleaning implants with a dose of 8/spl times/10/sup 17/ ions/cm/sup 2/. For the Xe/sup +/ cleaning implant, a stronger sputtering effect had been expected for its larger mass, but the contamination reduction was a little less than that of the Ar/sup +/ cleaning implant because of less beam current. Regarding F/sup +/ and SiF/sub 3//sup +/ cleaning implants, the reduction is at a higher rate than for the Ar/sup +/ case at the same cleaning dose. However, the elapsed time of the cleaning implant was almost the same as that of the Ar/sup +/ cleaning implant, but used less beam current. Therefore, for effectiveness and ease of use, an Ar/sup +/ cleaning implant with as high current as possible is recommended for beam cleaning. |
| Starting Page | 703 |
| Ending Page | 706 |
| File Size | 320302 |
| Page Count | 4 |
| File Format | |
| ISBN | 0780364627 |
| DOI | 10.1109/IIT.2000.924250 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2000-09-17 |
| Publisher Place | Austria |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Cleaning Implants Sputtering Argon Pollution measurement Atomic measurements Surface contamination Chemicals Power engineering and energy Production |
| Content Type | Text |
| Resource Type | Article |
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