NDLI: Dosimetry enhancements for Varian's high-energy ion implanters

Content Provider	IEEE Xplore Digital Library
Author	Bisson, J. Zhiyong Zhao
Copyright Year	2000
Description	Author affiliation: Varian Semicond. Associates Inc., Newburyport, MA, USA (Bisson, J.)
Abstract	Two of the most important aspects of ion implanters are dose accuracy and repeatability. Space limitation inside the MeV process chamber requires that a small disc Faraday cup be used. The old disc Faraday cup on these high-energy implanters exhibited dose inaccuracy at very low energies. A new effective disc faraday cup assembly was designed to correct the problem. One of the major issues associated with the old cup was the ability to capture larger beams at low energy implants. The new cup was designed to have a large enough opening to capture the whole beam in a wider working energy range. For higher energy implants, emphasis on the design had to be placed to prevent the escape of secondary and tertiary electrons. The edges for the cover and suppression aperture were designed to minimize the escape of the secondary/tertiary electrons. A strong magnetic field was added to help to suppress the secondary electrons and ions. Although the aspect ratio is less than 1:1, the data gathered from the tests on the new disc Faraday cup showed very good results. Since preventative maintenance must be performed periodically on the cup assembly, mechanical re-assembly can also be a factor in the repeatability process. Mechanical components were redesigned to minimize the repeatability issues.
Starting Page	666
Ending Page	669
File Size	327630
Page Count	4
File Format	PDF
ISBN	0780364627
DOI	10.1109/IIT.2000.924241
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2000-09-17
Publisher Place	Austria
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Dosimetry Assembly Implants Testing Electron emission Energy capture Preventive maintenance Ion beams Lifting equipment Postal services
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in