NDLI: Dose control accuracy in pressure compensation

Content Provider	IEEE Xplore Digital Library
Author	Sano, M. Kabasawa, M. Tsukihara, M. Sugitami, M.
Copyright Year	2000
Description	Author affiliation: Sumitomo Eaton Nova Corp., Sci. & Technol., Toyo, Japan (Sano, M.)
Abstract	NV-GSD series ion implanters utilize pressure compensation systems to suppress dose shifts resulting from charge exchange between the ions and residual gas in the beam line such as from plasma shower systems or photoresist outgassing. Here we report on the following improvements in the pressure compensation system, which increase both its accuracy and availability : (i) a consideration of charge exchange in the analyzer magnet region, referred to as the beam line effect (ii) tabulation of pressure compensation factors to aid the automation of the pressure compensation system, and (iii) adoption of a new type of ion gauge which shows less variation between individual units as well as more stable behavior over time. As a result, the deviation in sheet resistance of implanted photoresist-containing wafers from implanted bare wafers is reduced to less than 1% (1/spl sigma/). The improved pressure compensation system described here is currently available on the NV-GSDIII series high current implanters.
Starting Page	682
Ending Page	685
File Size	349328
Page Count	4
File Format	PDF
ISBN	0780364627
DOI	10.1109/IIT.2000.924245
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2000-09-17
Publisher Place	Austria
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Pressure control Resists Plasmas Magnetic analysis Current measurement Particle beams Charge measurement Availability Pressure measurement Automation
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in