NDLI: A methodology for the early exploration of design rules for multiple-patterning technologies

Content Provider	IEEE Xplore Digital Library
Author	Ghaida, R.S. Sahu, T. Kulkarni, P. Gupta, P.
Copyright Year	2012
Description	Author affiliation: UCLA, Electrical Engineering Dept. (Ghaida, R.S.; Sahu, T.; Kulkarni, P.; Gupta, P.)
Abstract	Double/Multiple-patterning (DP/MP) lithography in a multiple litho-etch steps process is a favorable solution for technology scaling to the 20nm node and below. Mask-assignment conflicts represent the biggest challenge for MP and limiting them through design rules is crucial for the adoption of MP technology. In this paper, we offer a methodology for the early evaluation and exploration of layout and MP rules intended for speeding up the rules-development cycle. Using a novel wiring-estimation method, we create layout estimates with fine-grained congestion prediction. MP-conflicts are then predicted using a machine-learning approach. In this work, we demonstrate the use of the method for double-patterning lithography in litho-etch-litho-etch process; the methodology is more general, however, and can be applied for other multiple-patterning technologies including tripe/multiple-patterning with multiple litho-etch steps, self-aligned double patterning (SADP), and directed self-assembly. Results of testing the methodology on standard-cell layouts show an 81% accuracy in DP-conflicts prediction. The methodology was then used to explore DP and layout rules and investigate their effects on DP-compatibility and layout area. The methodology allows for rules optimization; for example, pushing the minimum tip-to-side same-color spacing rule value from 1.7× to 1.5× the minimum side-to-side spacing design rule (i.e., from 110nm down to 90nm) would more than double the number of DP-compatible cells in the library.
Starting Page	50
Ending Page	56
File Size	732851
Page Count	7
File Format	PDF
ISBN	9781450315739
ISSN	10923152
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-11-05
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Association for Computing Machinery, Inc. (ACM)
Subject Keyword	Layout Tiles Wiring Training Estimation Artificial neural networks Testing
Content Type	Text
Resource Type	Article
Subject	Computer Graphics and Computer-Aided Design Computer Science Applications Software

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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