NDLI: Novel submicron process development tool for SAW device fabrication

Content Provider	IEEE Xplore Digital Library
Author	Jacobs, J. Dufilie, P.
Copyright Year	2014
Description	Author affiliation: Phonon Corp., Simsbury, CT, USA (Jacobs, J.; Dufilie, P.)
Abstract	SAW device performance is highly dependent on linewidth and metal edge quality. Small changes in each can have strong effects on device performance. At submicron linewidths, detecting these changes is often challenging. The limited field of view at higher magnifications can make accurate navigation between and within similar test structures difficult. Our objective in this work is to determine the process parameters needed to fabricate SAW resonator devices having a/p values of 0.6 for periods of 0.5μm and 0.6μm using contact lithography and a liftoff process. A novel test pattern that will enable efficient and accurate navigation of submicron test structures during high magnification scanning electron microscopy (SEM) will be presented. Using these test structures we can evaluate the a/p and line edge quality for each linewidth/ period group. For the first test mask no linewidth compensation was made to account for processing variations. Based on measured results, a second mask was then designed to compensate for the observed bias, in order to obtain the desired a/p.
Starting Page	2556
Ending Page	2559
File Size	4436320
Page Count	4
File Format	PDF
e-ISBN	9781479970490
DOI	10.1109/ULTSYM.2014.0638
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2014-09-03
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Metals Optical resonators Strips Navigation Surface acoustic wave devices Fabrication Performance evaluation fabrication SAW Resonator photomask
Content Type	Text
Resource Type	Article

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