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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Sakharov, S. Zabelin, A. Medvedev, A. Buzanov, O. Kondratiev, S. Roshchupkin, D. Shvetsov, A. Zhgoon, S. |
| Copyright Year | 2014 |
| Description | Author affiliation: Dept. of Radio Eng. Fundamentals, Nat. Res. Univ., Moscow, Russia (Shvetsov, A.; Zhgoon, S.) || JCS Fomos-Mater., Moscow, Russia (Sakharov, S.; Zabelin, A.; Medvedev, A.; Buzanov, O.; Kondratiev, S.) || Inst. of Microelectron. Technol. & High-Purity Mater., Chernogolovka, Russia (Roshchupkin, D.) |
| Abstract | Photolithography together with ion beam etching was used for fabrication of high temperature SAW devices. Ir thin film of 0.3 μm thick was deposited by magnetron sputtering without additional adhesion layers and than Ir film was annealed after electrode patterning in different conditions. The resistivity of magnetron sputtered thick Ir films drops noticeably after annealing. However, this process requires special care in order to avoid delaminating of the film due to developing high stress during such procedures. We have annealed the substrates with Ir films in different regimes and in different gas/vacuum conditions. The results of these studies have shown that annealing in air up to about 500 °C decreases the Ir film resistivity 1.5-2 times. Vacuum annealing did not show much improvement in comparison to open air annealing. Magnetron sputtered thin Ir films have somewhat porous structure allowing oxygen to diffuse from the substrate surface through Ir films. Resonator structures with thick Ir electrodes were prepared and tested. Examples of the resonator structures show very promising properties, such as high conductance and high Q-factor. |
| Starting Page | 377 |
| Ending Page | 380 |
| File Size | 1781372 |
| Page Count | 4 |
| File Format | |
| e-ISBN | 9781479970490 |
| DOI | 10.1109/ULTSYM.2014.0093 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2014-09-03 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Annealing Electrodes Magnetomechanical effects Magnetic films Substrates Amorphous magnetic materials magnetron sputtering LGS high temperature SAW devices Ir film Q factor |
| Content Type | Text |
| Resource Type | Article |
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