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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Imteyaz Ahmad, M. Fields, J.D. Pool, V.L. Yu Jiafan Van Campen, D. Parilla, P.A. Ginley, D.S. van Hest, M.F. Toney, M.F. |
| Copyright Year | 2015 |
| Description | Author affiliation: Stanford Synchrotron Radiat. Lightsource, SLAC Nat. Accel. Lab., Menlo Park, CA, USA (Imteyaz Ahmad, M.; Pool, V.L.; Yu Jiafan; Van Campen, D.; Toney, M.F.) || Nat. Renewable Energy Lab., Golden, CO, USA (Fields, J.D.; Parilla, P.A.; Ginley, D.S.; van Hest, M.F.) |
| Abstract | The front contact metallization of Si solar cells begins with printing a mixture of an Ag powder, glass frit (mixture of metal oxides such as PbO, $SiO_{2},$ $B_{2}O_{3},$ and $Bi_{2}O_{3})$ and an organic binder over the antireflection coating that is subsequently fired up to about 825 °C. It is known that the frit allows the paste to react with and burn through the anti-reflective coating such that the metal can react with the underlying c-Si during firing. However, the precise phase transformations between Ag, Si, SiNx, and the frit constituents, which happen within a few seconds during rapid thermal processing (RTP), giving rise to an Ag-Si contact, are not well understood in the absence of in-situ characterization under the actual processing conditions. We have carried out in-situ x-ray diffraction studies on sample mixtures of different component powders (Ag, sinks, PbO-fruit and Si) under realistic processing conditions using an in-situ rapid thermal processing setup. We track the phase progression and reaction pathways at a time resolution of 100 milliseconds. We show the direct evidence of SiNx oxidation by PbO between 600-750 °C. On subsequent heating to higher temperature, up to 825 °C, Ag dissolves into the frit etches the c-Si surface and is deposited on etch pits forming intimate electrical contacts. |
| Starting Page | 1 |
| Ending Page | 4 |
| File Size | 2983817 |
| Page Count | 4 |
| File Format | |
| e-ISBN | 9781479979448 |
| DOI | 10.1109/PVSC.2015.7355649 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2015-06-14 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Silicon Lead Heating Firing X-ray diffraction Temperature measurement Oxidation in-situ x-ray diffraction Si solar cell metallization |
| Content Type | Text |
| Resource Type | Article |
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