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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Ahmad, W. Qiang Chen Li-Rong Zheng Tenhunen, H. |
| Copyright Year | 2011 |
| Description | Author affiliation: Department of Electronics, Computer and Software Systems, KTH, School of Information and Communication Technologies, Forum 120,, 164 40 Kista, Sweden (Ahmad, W.; Qiang Chen; Li-Rong Zheng; Tenhunen, H.) |
| Abstract | The 3D-DRAM stacked over the processor is a vibrant technique in order to overcome the memory wall as well as the bandwidth wall problems. We considered a system with two DRAM dies over a single processor die. We assumed the decoupling capacitors to be placed on each DRAM die and connected to the power distribution TSV pairs, where the TSVs pass through the DRAM stack. In this paper we proposed a mathematical model for the optimum value of the decoupling capacitance on each DRAM die along with the optimum values of the effective resistance of the interconnecting power distribution TSV pairs in order to ensure the power integrity of the logic load during switching. The proposed model has a maximum of 1.1% error as compared to the Ansoft Nexxim4.1. |
| Starting Page | 590 |
| Ending Page | 594 |
| File Size | 819047 |
| Page Count | 5 |
| File Format | |
| ISBN | 9781457719837 |
| e-ISBN | 9781457719820 |
| e-ISBN | 9781457719813 |
| DOI | 10.1109/EPTC.2011.6184489 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2011-12-07 |
| Publisher Place | Singapore |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Random access memory Capacitance Through-silicon vias Power distribution Mathematical model Three dimensional displays Capacitors Power integrity Decoupling capacitance 3D-DRAM |
| Content Type | Text |
| Resource Type | Article |
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