NDLI: Investigation of initial stage of hybrid X pinches

Content Provider	IEEE Xplore Digital Library
Author	Tilikin, I.N. Dimitriev, A.S. Mingaleev, A.R. Mishin, S.N. Romanova, V.M. Ter-Oganesyan, A.E. Shelkovenko, T.A. Pikuz, S.A. Hoyt, C.L. Gourdain, P.A. Cahill, A.D. Greenly, J.B. Hammer, D.A.
Copyright Year	2013
Description	Author affiliation: P.N. Lebedev Inst., Moscow, Russia (Tilikin, I.N.; Dimitriev, A.S.; Mingaleev, A.R.; Mishin, S.N.; Romanova, V.M.; Ter-Oganesyan, A.E.) \|\| Cornell Univ., Ithaca, NY, USA (Shelkovenko, T.A.; Pikuz, S.A.; Hoyt, C.L.; Gourdain, P.A.; Cahill, A.D.; Greenly, J.B.; Hammer, D.A.)
Abstract	Summary form only given. The initial stage a hybrid X pinch (HXP) plasma formation has been studied using laser probing x-ray radiography and electrical measurements. This stage is especially interesting in HXPs in comparison with standard X-pinches because of the strong influence of the electrode plasmas on the process of neck development. Electrode material evaporated by strong UV radiation from the exploding wire can shorten the electrode gap before hot spot formation. The interaction of electrodes plasmas and the exploding wire plasma determines the discharge parameters required for proper HXP operation. The experiments in this work were performed on different pulsers with output current from 4 kA to 1.2 MA and current rise time from 50 ns to 340 ns. The low inductance super small pulse generator Micro based on ceramic capacitors and a flashover vacuum optically triggered switch was specially designed to study the initial phase of the HXP. This pulser with a peak current of 5 kA and current rise rate 100 A/ns reproduced very well the processes in HXPs on more powerful devices in first tenths nanoseconds of the discharge and enables us to study the details of plasma formation without powering big machines. The results obtained on the Micro pulser were compared with the results obtained in experiments on our older pulsers GVP (10 kA, 350 ns) and BIN (250 kA, 100 ns) at the Lebedev Institute, and XP (400 kA, 100 ns) and COBRA (1 MA, 100 ns) at Cornell University. It was shown that in HXPs from materials with low melting temperature and high core expansion rate (Al, Cu, Ag, Au) the wire core expands and fills inter-electrode gap and prevents fast diode shortening by the electrode plasma. That makes possible using relatively long pulse drivers for HXP.
Starting Page	1
Ending Page	1
File Size	115640
Page Count	1
File Format	PDF
ISBN	9781467351713
ISSN	07309244
DOI	10.1109/PLASMA.2013.6635138
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2013-06-16
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Plasmas Electrodes Wires Educational institutions X-ray lasers Materials Discharges (electric)
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
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