NDLI: Development of compact electron cyclotron resonance plasma source

Content Provider	IEEE Xplore Digital Library
Author	Ganguli, A. Tarey, R.D. Arora, N. Narayanan, R. Akhtar, K.
Copyright Year	2013
Description	Author affiliation: Indian Inst. of Technol., New Delhi, New Delhi, India (Ganguli, A.; Tarey, R.D.; Arora, N.; Narayanan, R.) \|\| ILM Technol., Boise, ID, USA (Akhtar, K.)
Abstract	Although it is well known that electron cyclotron resonance (ECR) produced plasmas are efficient, high-density sources and have potential applications in industry, a compact ECR plasma source still remains to be developed. This paper discusses the development of a novel, compact ECR plasma (CEP) source that is both portable and easily mountable on a chamber of any size.The design of the CEP is based on our detailed investigations1-2 of microwave coupling into a plasma loaded conducting waveguide and its subsequent absorption by the ECR process. It treats the plasma source section of the CEP like a plasma loaded waveguide which can support a number of guided plasma waves that are both resonant (resonating at Zce \| Z), and non-resonant (propagating through the Zce \| Z layer). Also, these modes suffer a reversal of polarization along the radius (from right hand polarized to left and vice versa) so that both azimuthal modes m = + 1 (RCP on axis) and m = 1 (LCP on axis) are absorbed with equal ease. The design of the CEP uses a fully integrated microwave line (including a quartz, microwave window) for operation at 2.45 GHz, 800 Watts, cw. The required magnetic field is produced by a set of suitably designed NdFeB ring magnets. The paper discusses the development of the CEP sources in light of the above physics issues and presents characterization results using a single CEP source. These CEP sources were developed for very large volume plasma production and up to twelve such sources have also been used for producing plasma in a large volume plasma system3 (diameter \| 1m, height 1.55 m).
Starting Page	1
Ending Page	1
File Size	137595
Page Count	1
File Format	PDF
ISBN	9781467351713
ISSN	07309244
DOI	10.1109/PLASMA.2013.6633473
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2013-06-16
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Cyclotrons Plasma sources Loaded waveguides Absorption Production Electric potential
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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