NDLI: Plasma production in large volume plasma system by compact electron cyclotron resonance sources

Content Provider	IEEE Xplore Digital Library
Author	Tarey, R.D. Arora, N. Ganguli, A. Narayanan, R.
Copyright Year	2013
Description	Author affiliation: Indian Inst. of Technol., New Delhi, New Delhi, India (Tarey, R.D.; Arora, N.; Ganguli, A.; Narayanan, R.)
Abstract	Summary form is given. There are several applications which require plasma to be produced over large volumes (~ few cubic meters) and where it is desirable to have high radial / axial uniformity and high plasma density. Although electron cyclotron resonance (ECR) plasma sources are efficient and yield high plasma $densities^{1}$ these do not scale well with the volume. This paper presents a scheme for large volume plasma production that retains the advantages of ECR plasma sources without sacrificing on uniformity or high plasma density. It uses multiple, compact ECR plasma (CEP) sources2 that are highly portable and easily mountable on any chamber. The large volume plasma system (LVPS) described in the paper is a scalable, circular cylindrical vessel of diameter = 1m, consisting of source sections (SS) and spacer sections (SPS). The CEPs are mounted in an azimuthally symmetric manner on matching ports along the periphery of the source sections, and the system was configured for 4 / 6 CEPs (one SS, two SPS, height = 1.1 m) and 8 /12 CEPs (two SS and three SPS, height = 1.55 m). Since plasma filling of the system in this scheme is radially inwards, the decrease in the volume to be filled as the plasma flows inwards, partially offsets the depletion of plasma as it flows away from the sources. This results in a more uniform plasma density over the system volume. The scheme also takes advantage of the magnetic field of the CEPs (produced by ring magnets) to produce a cusp magnetic field inside the chamber aiding confinement and uniformity. Typically, the bulk plasma density in the LVPS is = $5x10^{10}$ $cm^{-3}$ to = $5x10^{11}$ $cm^{-3}$ and bulk electron temperature = 1 - 2 eV, depending on argon gas pressure (0.5 - 10 mTorr) and microwave power (200 - 600 W per CEP at 2.45 GHz). The radial uniformity is typically = 2 to 5 % up to r = 0.4 m. The paper presents detailed results in conjunction with the theoretical model developed.
Starting Page	1
Ending Page	1
File Size	134026
Page Count	1
File Format	PDF
ISBN	9781467351713
ISSN	07309244
DOI	10.1109/PLASMA.2013.6633474
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2013-06-16
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Plasma density Plasma sources Production Cyclotrons Magnetic fields Microwave antennas
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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