NDLI: High moment soft FeCoN/NiFe laminated thin films

Content Provider	IEEE Xplore Digital Library
Author	Hai Jiang Sin, K. Yingjian Chen
Copyright Year	1965
Abstract	Fe/sub 70/Co/sub 30/N/Ni/sub 55/Fe/sub 45/ laminated thin films were sputtered onto the glass and Si wafers by dc magnetron sputtering using different N/sub 2//Ar gas mixtures. The structure and magnetic properties of the films were investigated by the XRD, TEM, and B-H loop tracer. A soft FeCoN/NiFe laminated thin film with a B/sub S/ of 2.40 T and a well-defined uniaxial anisotropy has been achieved at the optimized conditions. It was found that the incorporation of nitrogen in the FeCo films does not change the lattice constant of FeCo, but it does change the film stress from compressive to tensile. It is believed that the combination of tensile stress and positive magnetostriction maintains the softness of FeCoN/NiFe laminated thin film beyond 1 /spl mu/m.
Sponsorship	IEEE Magnetics Society
Starting Page	2896
Ending Page	2898
Page Count	3
File Size	504151
File Format	PDF
ISSN	00189464
Volume Number	41
Issue Number	10
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-10-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Transistors Sputtering Tensile stress Iron Magnetostriction Semiconductor thin films Glass Magnetic anisotropy Perpendicular magnetic anisotropy Argon inductive write head FeCo alloys high moment materials
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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