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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Huang, Z.H. |
| Copyright Year | 2010 |
| Description | Author affiliation: Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, Singapore, 638075 (Huang, Z.H.) |
| Abstract | A few oxide thin films, SiO2, TiO2, Al2O3 and ZrO2 were deposited by e-beam evaporation and evaluated on their encapsulation performance. Ca buttons were used as sensors to detect the permeated oxygen and moisture through the oxide barrier layers. The metal Ca sensors coated by the barrier layers were microscopically observed. The results showed that the optimal single layer thickness was varied from 10 to 50 nm, depending on the oxide material. A thicker layer than 60 nm was not helpful for improvement of barrier performance, likely due to the existence of imperfects on substrate and the creation of cracks due to the large residual stress of the oxide thin films. As thin film encapsulation materials, e-beam evaporated Al2O3 and ZrO2 are superior to SiO2 and TiO2 in barrier performance. |
| Starting Page | 23 |
| Ending Page | 26 |
| File Size | 1201063 |
| Page Count | 4 |
| File Format | |
| ISBN | 9781424485604 |
| e-ISBN | 9781424485628 |
| e-ISBN | 9781424485611 |
| DOI | 10.1109/EPTC.2010.5702599 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2010-12-08 |
| Publisher Place | Singapore |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Encapsulation Aluminum oxide Films Substrates Glass Microscopy |
| Content Type | Text |
| Resource Type | Article |
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