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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Hesse, D. Mattheis, R. Werner, P. |
| Copyright Year | 1998 |
| Description | Author affiliation: Max-Planck-Inst. fur Mikrostructurphys., Halle, Germany (Hesse, D.) |
| Abstract | Growth kinetics and interface structures of epitaxial, nanometer-sized NiSi/sub 2/ islands of A- and B-orientations on Si(111) single-crystal substrates are studied by RBS, TEM/SAED, and high-resolution TEM on cross sections. The islands grow by an in situ solid state reaction between the silicon substrate and a nickel vapour at temperatures of 300/spl deg/C and 400/spl deg/C. Owing to a crossover of the thermal expansion curves of NiSi/sub 2/ and Si at 400/spl deg/C, stresses determine the shares of (three-dimensional) A-islands and (two-dimensional) B-islands at different temperatures. Furthermore, A-islands contain dislocations, whereas B-islands are completely free from lattice defects, with the exception of interfacial steps of various heights occurring at the NiSi/sub 2//Si(111) growth fronts of both island types. These steps play an essential role in the island growth. The difference in the reaction kinetics observed between A- and B-islands at 400/spl deg/C is explained in terms of different kinetic reaction barriers present at the structurally different NiSi/sub 2/Si(111) growth fronts under the A-and B-islands. |
| Starting Page | 260 |
| Ending Page | 263 |
| File Size | 305068 |
| Page Count | 4 |
| File Format | |
| ISBN | 0780343069 |
| DOI | 10.1109/ICSICT.1998.785869 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1998-10-23 |
| Publisher Place | China |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Kinetic theory Substrates Temperature Thermal stresses Nanostructures Solid state circuits Silicon Nickel Thermal expansion Lattices |
| Content Type | Text |
| Resource Type | Article |
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