NDLI: Solution Processed Large Area Surface Textures Based on Dip Coating

Content Provider	IEEE Xplore Digital Library
Author	Yuehui Wang Hongjun Yang Li Chen Weidong Zhou Meng Tao Qing Guo
Copyright Year	2008
Description	Author affiliation: Dept. of Electr. Eng., Univ. of Texas at Arlington, Arlington, TX (Yuehui Wang; Hongjun Yang; Li Chen; Weidong Zhou; Meng Tao)
Abstract	We report here the dip coating processes for the formation of large area self-assembled monolayer of micro- sized silica spheres, on glass and on silicon substrates. The self- assembled structure and its spatial extent of monolayer were significantly influenced by the concentration of the suspension and the type of solvent, dip coating withdrawal speed, sample immersion time, relative humidity and substrate types. Record large areas of uniformly coated structures were formed with dimensions of 3times10 $mm^{2}$ and 1.5times11 $mm^{2}$ on the silicon and glass substrates, respectively. The rapid self-assembled monolayer with silica microspheres provided a glimpse at the wide range of coating and photonic device applications where dip coating can be used.
Starting Page	771
Ending Page	774
File Size	987138
Page Count	4
File Format	PDF
ISBN	9781424421039
DOI	10.1109/NANO.2008.230
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2008-08-18
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Substrates Coatings Silicon compounds Surface treatment Glass Suspensions Dip coating
Content Type	Text
Resource Type	Article

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