NDLI: Deposition of biaxially aligned yttria stabilized zirconia layers on metal tape by modified magnetron sputtering

Content Provider	IEEE Xplore Digital Library
Author	De Winter, G. Denul, J. De Gryse, R.
Copyright Year	2002
Abstract	Biaxially aligned thin films of yttria stabilized zirconia (YSZ) are frequently used as buffer layers for the development of high current carrying YBa/sub 2/Cu/sub 3/O/sub 7-x/ coated conductor. In this research, biaxially aligned YSZ has been deposited on different substrate materials (glass, metal, polymer) using a modified magnetron as a source of both the particles to be deposited and a directed flux of energetic particles normal to the sputter target to induce biaxial alignment. By varying different deposition parameters, an ion assisted deposition process was developed and optimized which resulted in the deposition of in-plane textured layers of YSZ on metal tape with a FWHM of 11/spl deg/-13/spl deg/, which was measured with XRD (x-ray diffraction) pole figures. The deposition rate was as high as 43.3 nm/min. It was demonstrated that the developed deposition process is suitable for continuous deposition of biaxially aligned YSZ layers on a moving metal tape.
Sponsorship	Council on Superconductivity Appl. Superconductivity Conference Inc MIT
Starting Page	2893
Ending Page	2896
Page Count	4
File Size	453917
File Format	PDF
ISSN	10518223
Volume Number	11
Issue Number	1
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2001-03-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Conducting materials Magnetic materials Transistors Buffer layers Conductive films Inorganic materials Glass Polymers Magnetic flux X-ray scattering
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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