NDLI: Effect of sputtering induced oxygen plasma on recovery of EuBa/sub 2/Cu/sub 3/O/sub x/ films

Content Provider	IEEE Xplore Digital Library
Author	Michikami, O. Wakana, H. Hashimoto, T.
Copyright Year	2002
Abstract	Activated oxygen plasma (AOP) annealing has been proposed as a recovery treatment in a decompressed oxygen atmosphere. As-sputtered EuBa/sub 2/Cu/sub 3/O/sub 7/ (EBCO) thin films with a T/sub c/ endpoint (T/sub ce/) of 90 K were used for deterioration and recovery treatments. The removal and recovery for oxygen atoms was clarified from in-situ measurements of electrical resistance (R). The AOP annealing had a better recovery effect than pure oxygen annealing. AOP recovery conditions of annealing temperature (T/sub sa/) of 450-700/spl deg/C, plasma exposure and annealing time (t/sub p/) Of more than 40 min, and oxygen pressure (P/sub O2/spl caron/(pc)/) of more than 200 Pa were found to be appropriate. The AOP diffused around to the back side of a shutter, even one of 15 cm in radius, and diffused to a gap distance of 0.1 cm between the film and the shutter, restoring the degraded films to the high-quality characteristics.
Sponsorship	Council on Superconductivity Appl. Superconductivity Conference Inc MIT
Starting Page	3197
Ending Page	3200
Page Count	4
File Size	423540
File Format	PDF
ISSN	10518223
Volume Number	11
Issue Number	1
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2001-03-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Sputtering Annealing Atomic measurements Plasma measurements Plasma temperature Atmosphere Electrical resistance measurement Electric variables measurement Electric resistance Degradation
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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Variation of the oxygen content in YBa/sub 2/Cu/sub 3/O/sub 7-x/ films deposited by high oxygen pressure DC-sputtering

Dissipation mechanisms in EuBa/sub 2/Cu/sub 3/O/sub 7//SrTiO/sub 3/ and EuBa/sub 2/Cu/sub 3/O/sub 7//PrBa/sub 2/Cu/sub 3/O/sub 7/ multilayers

Normal state electrical measurements near the ferroelastic phase transformation in single crystal YBa/sub 2/Cu/sub 3/O/sub 7- delta /

Ozone processing of MBE grown of YBa/sub 2/Cu/sub 3/O/sub 7-x/ films

Critical currents and thermal activation in a-axis oriented EuBa/sub 2/Cu/sub 3/O/sub 7/ thin films

The behaviour and properties of in-situ formed YBa/sub 2/Cu/sub 3/O/sub x/ thin films during reversible oxidation/deoxidation

Large area YBa/sub 2/Cu/sub 3/O/sub 7/ films for high power microwave applications

Stripline resonator measurements of Z/sub s/ versus H/sub rf/ in YBa/sub 2/Cu/sub 3/O/sub 7-x/ thin films

Magneto-conductivity in NdBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// thin film

Effect of sputtering induced oxygen plasma on recovery of EuBa/sub 2/Cu/sub 3/O/sub x/ films

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Variation of the oxygen content in YBa/sub 2/Cu/sub 3/O/sub 7-x/ films deposited by high oxygen pressure DC-sputtering

Dissipation mechanisms in EuBa/sub 2/Cu/sub 3/O/sub 7//SrTiO/sub 3/ and EuBa/sub 2/Cu/sub 3/O/sub 7//PrBa/sub 2/Cu/sub 3/O/sub 7/ multilayers

Normal state electrical measurements near the ferroelastic phase transformation in single crystal YBa/sub 2/Cu/sub 3/O/sub 7- delta /

Ozone processing of MBE grown of YBa/sub 2/Cu/sub 3/O/sub 7-x/ films

Critical currents and thermal activation in a-axis oriented EuBa/sub 2/Cu/sub 3/O/sub 7/ thin films

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Stripline resonator measurements of Z/sub s/ versus H/sub rf/ in YBa/sub 2/Cu/sub 3/O/sub 7-x/ thin films

Magneto-conductivity in NdBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// thin film

Effect of sputtering induced oxygen plasma on recovery of EuBa/sub 2/Cu/sub 3/O/sub x/ films