NDLI: Nanolithography and CAD challenges for 32nm/22nm and beyond

Content Provider	IEEE Xplore Digital Library
Author	Pan, David Z. Renwick, Stephen Singh, Vivek Huckabay, Judy
Copyright Year	2008
Description	Author affiliation: Nikon Precision, Inc., Belmont, CA, USA (Renwick, Stephen) \|\| Intel Corp., San Jose, CA, USA (Singh, Vivek) \|\| Univ. of Texas, Austin, USA (Pan, David Z.) \|\| Cadence Design Systems, Inc., San Jose, CA, USA (Huckabay, Judy)
Abstract	The semiconductor industry is stuck at 193nm lithography as the main workhorse for manufacturing integrated circuits of 45nm and most likely 32nm nodes. On one hand, many novel approaches are being developed to extend the 193nm lithography, including immersion, double patterning, and exotic resolution enhancement techniques. On the other hand, next generation lithography, in particular, extreme ultra violet lithography (EUVL) is projected by ITRS as the main contender for technology nodes at or below 22nm, though significant challenges still exist from both technology and economy aspects. This tutorial will cover key nanolithography and CAD challenges with possible solutions for 32nm/22nm (and beyond?), from the underlying hardware/equipment perspectives (for double patterning, EUV, and so on), to the computational lithography aspects (extreme RET, inverse lithography, pixelated mask, etc.), and to the key EDA issues on nanolithofriendly layouts (e.g., double patterning compliance layout, and so on).
File Size	131971
File Format	PDF
ISBN	9781424428199
ISSN	10923152
DOI	10.1109/ICCAD.2008.4681537
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2008-11-10
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Nanolithography Lithography Embedded software National electric code Chaos Software quality Software maintenance Arithmetic Application software Productivity
Content Type	Text
Resource Type	Article
Subject	Computer Graphics and Computer-Aided Design Computer Science Applications Software

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