NDLI: Optimal Side Shield Write Head Design for Ultra-High Recording Density

Content Provider	IEEE Xplore Digital Library
Author	Yong-Su Kim Kukhyun Sunwoo Kyusik Sin
Copyright Year	1965
Abstract	In magnetic writing heads, one of the most important factors for ultra-high recording density is the skirt width of write field along cross track direction without degradation of head field and field gradient. The side shield design is known to be the most powerful design for reducing the skirt width. However, the side shields reduce write field and field gradient weak. By finite-element method simulation, we propose the floating (separated) side shield to reduce skirt width without field degradation of write head. As a result, we were able to reduce skirt width from 350 to 250 nm with almost no head field degradation. In addition to increasing the recording density, the separated side shield design provides other benefits to head fabrication by reducing the topography of wafer process. We used design of experiment (DOE) tools, especially response surface method (RSM), to optimize the design. In the simulation, we took into account all soft magnetic materials (write head and soft magnetic underlayer). To verify the results, we checked the correlation between the head field of each shape and adjacent track encroachment (ATE).
Sponsorship	IEEE Magnetics Society
Starting Page	3591
Ending Page	3593
Page Count	3
File Size	582228
File Format	PDF
ISSN	00189464
Volume Number	44
Issue Number	11
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2008-11-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Magnetic heads Magnetic recording Soft magnetic materials Degradation Magnetic separation Magnetic shielding Writing Finite element methods Fabrication Surfaces separated side shield Adjacent track encroachment (ATE) field gradient finite-element analysis (FEA) head design perpendicular magnetic recording (PMR)
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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