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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Jin-Woo Yi Jong-Kuk Kim Eungsun Byon Sik Chol Kwon Seock-Sam Kim |
| Copyright Year | 2003 |
| Description | Author affiliation: Korea Inst. of Machinery & Mater., Changwon, South Korea (Jin-Woo Yi; Jong-Kuk Kim; Eungsun Byon; Sik Chol Kwon) |
| Abstract | Summary form only given, as follows. Diamond-like carbon(DLC) films are of considerable research interests because of their widespread applications as protective coatings in areas such as magnetic storage disks, biomaterial coatings and as micro-electromechanical devices(MEMs). Although DLC films have been considered as a strong candidate for various applications due to its excellent mechanical properties, their poor adhesion on tool steels limits the applications. In order to overcome this drawback, some ideas were introduced. Recently, ion implantation was used to improve the adhesion between thin film and substrate. In this work, we investigated effect of ion implantation on the adhesion strength of DLC film as a function of ion doses and implanted energies. Ti and W ions were implanted on the Si-wafer and WC-Co substrates, then DLC films were deposited by ion beam deposition method. A CSEM-REVETEST scratch tester was used to assess the adhesion characteristics. From results, the adhesion strength of films was improved as increasing ion implantation energy, however there was no significant change with ion dose. Further results, including morphology and compositional variation at the different ion energies and doses, will be presented. |
| Sponsorship | Plasma Sci. & Applications Committee of the IEEE Nucl. & Plasma Sci. Soc. Hanyang Univ. Japan Soc. Plasma Res. Assoc. Korea Atomic Energy Res. Inst. Korea Basic Sci. Inst. Korea Vacuum Soc |
| File Size | 62751 |
| File Format | |
| ISBN | 078037911X |
| ISSN | 07309244 |
| DOI | 10.1109/PLASMA.2003.1228798 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2003-06-05 |
| Publisher Place | South Korea |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Ion implantation Adhesives Magnetic films Coatings Substrates Protection Magnetic memory Mechanical factors Steel Transistors |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering |
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