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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Yang, P. Huang, N. Leng, Y.X. Kwok, S.C.H. Chen, J.Y. Wang, J. Leng, Y. Chu, P.K. |
| Copyright Year | 2003 |
| Description | Author affiliation: Dept. of Mater. Eng., Southwest Jiaotong Univ., Chengdu, China (Yang, P.; Huang, N.; Leng, Y.X.) |
| Abstract | Summary form only given, as follows. Summary form only given. Recently, carbon nitride films and amorphous carbon films have received much attention as potential biomedical materials. Plasma immersion ion implantation-deposition (PIII-D) is a novel surface modification method in the biomaterials field. Its major advantages are high efficiency and non-line-of-sight characteristic and it is readily adapted to biomechanical devices with complex shape. In this work, nitrogen-doped hydrogenated amorphous carbon (a-C:H,N) films were deposited by PIII-D using N/sub 2//C/sub 2/H/sub 2/ gas mixtures. Deposition was carried out at a constant RF power of 500 W. By adjusting the mix of N/sub 2//C/sub 2/H/sub 2/, a series of a-C:H,N films with different nitrogen contents were obtained. The film chemistry was examined using micro-Raman, XPS and FTIR. The surface morphology of the films was characterized by atomic force microscopy (AFM). The wettability of the films was measured by contact angle measurements employing different well-known liquids. The corrosion resistance was evaluated using electrochemical analysis. The results show that the wettability and corrosion resistance of the films are enhanced with increasing nitrogen concentration in the films and higher nitrogen fraction in the gas that also affects the evolution of the film structure and chemical bonds caused by nitrogen doping. One of the important experimental observations is that incorporation of nitrogen into the sixfold carbon rings structure breaks the symmetry in the sp/sup 2/ domains. |
| Sponsorship | Plasma Sci. & Applications Committee of the IEEE Nucl. & Plasma Sci. Soc. Hanyang Univ. Japan Soc. Plasma Res. Assoc. Korea Atomic Energy Res. Inst. Korea Basic Sci. Inst. Korea Vacuum Soc |
| File Size | 80900 |
| File Format | |
| ISBN | 078037911X |
| ISSN | 07309244 |
| DOI | 10.1109/PLASMA.2003.1228835 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2003-06-05 |
| Publisher Place | South Korea |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Plasma properties Amorphous materials Plasma immersion ion implantation Nitrogen Surface morphology Atomic force microscopy Biomedical measurements Electrical resistance measurement Goniometers Corrosion |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering |
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