NDLI: Thin film poly-Si solar cells with film thickness of 10 microns fabricated by direct deposition using APCVD method

Content Provider	IEEE Xplore Digital Library
Author	Ishikawa, Y. Nishioka, K. Yamamoto, Y. Uraoka, Y. Fuyuki, T.
Copyright Year	2002
Description	Author affiliation: Graduate Sch. of Mater. Sci., Nara Inst. of Sci. & Technol., Japan (Ishikawa, Y.; Nishioka, K.; Yamamoto, Y.; Uraoka, Y.; Fuyuki, T.)
Abstract	Thin film poly-Si solar cell grown by atmospheric pressure chemical vapor deposition (APCVD) has been fabricated. In order to realize excellent crystallinity poly-Si thin films, two-step deposition method was carried out. The poly-Si film with very high preferential orientation to (220) was obtained with a film thickness of 10 /spl mu/m and grain size of 3 /spl mu/m. Due to high temperature annealing effect, /spl mu/c-Si phase which existed at grain boundaries was disappeared completely. For fabricated thin film poly-Si solar cells, electrical properties were evaluated. Relatively high Jsc of 16.74 mA/cm/sup 2/ was obtained. Factors to promote the properties further were discussed. Results obtained in this work suggest the possibility of realization of high performance thin film poly-Si solar cells.
Sponsorship	IEEE Electron Devices Soc
Starting Page	1294
Ending Page	1297
File Size	262451
Page Count	4
File Format	PDF
ISBN	0780374711
ISSN	10608371
DOI	10.1109/PVSC.2002.1190846
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2002-05-19
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Sputtering Photovoltaic cells Temperature Transistors Semiconductor films Crystallization Grain size Grain boundaries Annealing Materials science and technology
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in